PECVD

PECVD

美 　英

• 網絡等離子增強化學氣相沉積(plasma enhanced chemical vapour deposition)；等離子體增強化學氣相沉積(Plasma Enhanced Chemical Vapor Deposition)；化學氣相沉積設備

例句

In this dissertation, we changed the PECVD technique parameters, and deposited amorphous, microcrystalline and polymorphous silicon films.

本論文通過改變PECVD工藝條件，制備了非晶、微晶和多形硅三種氫化硅薄膜。

This paper gives an overview of plasma enhanced chemical vapor deposition (PECVD) used in the solar industry.

本文針對電漿輔助化學氣相沉積在太陽能產業上的應用作一概略性的介紹。

Amorphous silicon is deposited at low temperature with plasma-enhanced chemical vapor deposition (PECVD).

非晶硅是存放在低溫等離子體增強化學氣相沉積（等離子體增強化學氣相沉積）。

First of all, plasma physics, PECVD equipment and its process principles are explained.

首先，對電漿物理、PECVD設備及制程原理加以闡述。

Plasma enhanced chemical vapor deposition (PECVD) technique is the primary method which is used to prepare hydrogenated silicon film.

等離子體化學氣相沉積技術制備氫化硅薄膜工藝條件成熟穩定而成為薄膜制備的首選方法。

Experimental study of breakdown characteristic of thin dielectric film in nanometre range formed by low temperature PECVD

PECVD法低溫形成納米級薄介質膜擊穿特性的實驗研究

Study of Microscopical Structure for the Dielectric Film in Nanometre Range Formed by Low Temperature PECVD

低溫PECVD法形成納米級介質膜微觀結構研究

Influence of Atomic Hydrogen on Transparent Conducting Oxide During Hydrogenated Microcrystalline Si Preparation by PECVD

PECVD沉積微晶硅薄膜過程中氫原子對透明導電膜的影響

Preparation of Crystalline-Silicon Film by PECVD at Low-Temperature and Its Growth Kinetics

PECVD低溫制備晶化硅薄膜及其機制淺析

Crystalline Control of Microcrystalline Silicon Thin Film Deposited by Low Temperature PECVD

PECVD法低溫制備微晶硅薄膜的晶化控制

Study on microstructure and tribological properties of diamond-like carbon films deposited by PECVD

PECVD法制備類金剛石薄膜的結構和摩擦學性能研究

Characterization of Fluorine and Carbon-Doped Silicon Oxide Film Deposited by PECVD

PECVD法淀積氟碳摻雜的氧化硅薄膜表征

plasma enhanced chemical vapor deposition (PECVD)

等離子體增強化學汽相淀積

PECVD Nanostructure Tungsten Carbide Thin Films at Low Temperature

低溫等離子體增強化學氣相沉積納米結構碳化鎢薄膜

Study on Technology for the Silicon Nitride Thin Films Grown on Polyimide by PECVD

PECVD法在聚酰亞胺上沉積氮化硅薄膜的工藝研究

Plasma Enhance Chemical Vapor Deposition (PECVD)

電漿增強式化學氣相沉積法

Study on Low Stress Silicon Nitride Deposited by PECVD with High Frequency

應用高頻激勵源制備低應力氮化硅薄膜研究

Physical Model of Interface Trap for Thin Film in Nanometre Range Formed by PECVD

PECVD形成納米級薄膜界面陷阱的物理模型

Fault Diagnosis of PECVD Device Based on Bayesian Networks

基于貝葉斯網絡的PECVD故障診斷技術

Micro-structure of PECVD Diamond Films by Slow Positron Beam

金剛石膜微結構的慢正電子束測量研究