ulsi
美 
英
- 網絡超大規模集成電路；特大規模集成電路(Ultra Large Scale IC)；甚大規模集成電路(upper large scale integration)
例句
A copper line having self assembled monolayer for use in ULSI semiconductor devices and methods of making the same are presented.
本發明提供用于ULSI半導體器件的具有自組裝單分子層的銅線及其制造方法。
Metal silicide films are extensively used as contact meterials in Ultra-large Scale Integrated Circuits (ULSI).
金屬硅化物薄膜是廣泛應用于超大規模集成電路器件的重要電子材料。
The no-blemish copper deposition in micro trench is the essential problem needing to be resolved in the development of ULSI manufacture.
微細凹槽內無空洞和縫隙缺陷鍍銅是集成電路芯片銅布線制造工藝技術發展中需解決的一個關鍵問題。
In this thesis, we focuse on the microstructure and stress of ULSI Cu interconnects with their impacts on MTF of the electromigration.
本論文主要研究了ULSI中銅互連線的微觀結構和應力及其對與電徙動MTF的影響。
Study on Controlling the Concentrations of Dissolved Oxygen and Total Organic Carbon in Water Used for ULSI
控制超大規模集成電路用水中的溶解氧和總有機碳濃度的研究
An Energy Transfer Photochemical Model for the Abatement of Total Organic Carbon in High Purity Water Used in ULSI Fabrication
降低超大規模集成電路用高純水中總有機碳的能量傳遞光化學模型
Study and Optimization of CMP Slurry Used to Tantalum Barrier Layer of Copper Interconnection in ULSI
ULSI銅多層布線中鉭阻擋層CMP拋光液的研究與優化
Extremely Ultraviolet Lithography Fabrication Technology for Nanometer ULSI Devices
制備納米級ULSI的極紫外光刻技術
State of the arts Cu interconnect and its reliability in ULSI
ULSI中銅互連及其可靠性的研究與進展
Influence of Interconnection Configuration on Thermal Dissipation of ULSI Interconnect Systems
超大規模集成電路互連系統的布線構造對散熱的影響
Theoretical Calculation on the Mechanical Characterization of ULSI Two-Layer Interconnect Films by Surface Acoustic Waves
表面波表征ULSI互連布線雙層薄膜機械特性的理論計算
Corrosive Wear Analysis of the Copper Chemical-mechanical Polishing in ULSI Manufacturing
ULSI制造中銅化學機械拋光的腐蝕磨損機理分析
A Novel Analytical Thermal Model for Temperature Estimation of Multilevel ULSI Interconnects
一種新型的集成電路金屬連線溫度分析解析模型
State-of-the-Art of the On-Chip Copper Interconnect Technology for ULSI's
集成電路片內銅互連技術的發展
Research and Prospects on Copper Chemical Mechanical Polishing in ULSI Manufacturing
ULSI制備中銅布線化學機械拋光技術的研究與展望
Chemical Mechanical Polishing of Silica Dielectric in ULSI Manufacturing
介質的化學機械拋光
RBR control applied on chemical -mechanical polishing process in ULSI manufacturing
RBR控制在超大規模集成電路制造的化學機械拋光工藝中的應用
Technology analysis of wafer chemical mechanical polishing in the manufacture of ULSI
超大規模集成電路制造中硅片化學機械拋光技術分析
Encapsulation of Copper Interconnects in ULSI Using Cobalt Alloys through Electroless Deposition
通過化學鍍用鈷合金密封ULSI中的銅互連
Analysis and Research of Cleaning Technology for ULSI Silicon Substrate Wafer
ULSI硅襯底片清洗技術的分析研究
Key Technologies for Copper Interconnections in ULSI
ULSI中銅互連線技術的關鍵工藝
The Engineering Maintenance of ULSI Design Software
超大規模集成電路設計軟件的工程化維護
Chemomechanical polishing technique of silicon substrate in ULSI
ULSI硅襯底的化學機械拋光技術
Development and Challenges of Lithography for ULSI
硅集成電路光刻技術的發展與挑戰
Study on fluorinated diamond-like carbon films for ULSI
ULSI用氟化類金剛石薄膜的研究
Study on Polishing Slurry for Silicon Substrate in ULSI
超大規模集成電路制備中硅襯底拋光液研究
Development of Diffusion Barrier for Cu Interconnection in ULSI
集成電路Cu互連擴散阻擋層的研究進展
Analysis of Hot Spots in ULSI Interconnect and Via Systems
ULSI中金屬互連系統上的熱點分析
Diffusion Barrier of Cu Metallization in ULSI
集成電路Cu金屬化中的擴散阻擋層
ULSI Ultra Large Scale Integration
超大規模集成
