photolithography
美 [?fo?to?l?'θ?gr?f?] 
英 [?f??t?l?'θ?gr?f?]
英漢解釋
英英解釋
例句
One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists.
規程的當中一個被使用在做整體集成電路克服這個問題是石版影印根據光致抗蝕劑。
that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.
測試晶圓片-影印過程中用于顆粒計算、量溶解度和檢測金屬污染的晶圓片。
One embodiment of the present invention provides techniques and systems for determining modeling parameters for a photolithography process.
一種用于為光刻工藝確定參數的方法，所述方法包括：接收布局；
Transmission phase gratings with continuous relief structures are fabricated with one step direct laser writing grayscale photolithography.
利用一步激光直寫灰階光刻方法制作了具有連續浮雕結構的透射式相位光柵。
The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.
無掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
Contact-mode photolithography was used for realizing the monolithic integration of 0.
采用光學接觸式光刻方式，實現了單片集成0。
Alignment Precision - Displacement of patterns that occurs during the photolithography process.
套準精度-在光刻工藝中轉移圖形的精度。
The principle for eliminating the diffraction error of photolithography with lens array is demonstrated by optical transfer function method.
用光學傳遞函數方法說明了透鏡陣列消除光刻中衍射誤差的原理。
Influences of side-wall slope of photolithography pattern on characteristic dimensions after ion implantation are analyzed.
分析了光刻圖形側墻斜坡對離子注入后圖形特征尺寸的影響。
A first photolithography process forms first and second diffusion trench openings for the first and second diffusion regions.
第一光刻工藝為第一和第二擴散區形成了第一和第二擴散溝槽開口。
Methods: Master stamps for soft lithography were produced using photolithography .
方法：主模版采用光刻方法制備，使用硅作為基片。
First, consider the advantages and disadvantages of photolithography.
首先，想想光蝕刻法的優點跟缺點。
The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.
首先，采用紫外光刻和化學濕法刻蝕技術在玻璃基片上加工微米深度的微通道；
The patterned anodic aluminum oxide (AAO) template was fabricated by UV-photolithography.
采用紫外光刻法制得圖案化的陽極氧化鋁模板。
Photolithography: forming electrodes in the form required on the ITO film.
光刻：在ITO表面形成要求形狀的電極。
The second photolithography process is carried out independent of the first photolithography process.
所述第二光刻工藝的執行獨立于所述第一光刻工藝。
Implementation Methods for Amplitude Division Maskless Laser Interference Photolithography
振幅分割無掩模激光干涉光刻的實現方法
Photolithography Process Simulation for Integrated Circuits and Microelectromechanical System Fabrication
集成電路和微電子機械系統加工過程中的光刻工藝模擬
Design and construction of an ultrahigh vacuum evaporation equipment for atom photolithography
原子光刻用超高真空蒸發設備的設計和建立
Application of Semiconductor Photolithography in Biochip Fabrication
半導體光刻技術在生物芯片制作中的應用
Optical proximity correction for improving pattern quality in submicron photolithography
光學鄰近校正改善亞微米光刻圖形質量
Implementation Methods for Wave-Front Division in Maskless Laser Interference Photolithography
波前分割無掩模激光干涉光刻的實現方法
New Filtering Approach on Partial Coherent Imaging System for Improving Photolithography Resolution
部分相干分數域濾波改善光刻分辨率新方法
Fabricating High Performance Diffractive Microlens by Single Step Photolithography and Wet Etching
采用單步光刻和濕法腐蝕工藝制作高性能衍射微透鏡
Experimental Study on Pupil Filtering Projection Photolithography
光瞳濾波投影光刻實驗研究
Improving the edge profiles of lithography patterns using gray-tone technique in digital photolithography
用灰度曝光技術改善數字光刻圖形輪廓
Laser Interference Photolithography for Fabricating Periodic Patterns in Large Area
用于大面積周期性圖形制造的激光干涉光刻
Application of Simulation Technology in the Dispatching of Photolithography Area in Wafer Fabrication
仿真技術在晶圓制造光刻區派工中的應用
A Study on Improving Imaging Resolution of Projection Photolithography with Pupil Filtering
光瞳濾波提高投影光刻成像分辨力研究
More complex photolithography operations for deep-submicron designs
深亞微米下的越趨復雜的光刻操作
Photolithography Using Super-Resolution Near Field Structure
超分辨近場結構光刻技術
Recent Progress in Photolithography Technology
光刻技術及其新進展
Auto-controlled Liquid Crystal Light Valve Arrays as Photolithography Shutter
自控液晶光閥組式光刻快門研究
Simulation of Solidification Process of Micro Stereo Photolithography
微光成型法實體模型固化過程的仿真
Analysis of nanometrology and atom photolithography
納米計量與原子光刻技術分析
Precompensation for Nonlinear Distortion in Thick Film Photolithography
厚膠光刻非線性畸變的校正
Research of Mask Division for Improving the Edge Sharpness of Photolithography
掩模分形提高光刻邊緣銳度的研究
The Attenuated Phase-Shifting Mask for KrF Excimer Laser Photolithography
用于KrF準分子激光光刻的衰減相移掩模
The Application of photolithography in Indium Bump Fabrication
光刻技術在銦柱制備工藝中的應用研究
The simulation analysis for photolithography process of microlens array
微透鏡列陣光刻工藝過程的模擬與分析
