photoresist
美 [?fo?to?r?'z?st] 
英 [f??t??r?'z?st]
英漢解釋
英英解釋
例句
When using the sputtering nickel system, photoresist and nickel Crosslinking became extremely easy-to-be strong enough to produce water.
在擱置濺射鍍鎳的編制洋，平刻膠與鎳交聯后變得格外堅硬，極易爆發水紋。
Where the UV light shines through, it chemically weakens the photoresist, leaving a pattern on the surface of the silicon.
在紫外光照射穿透的地方，光刻膠的化學特性會被削弱，使硅晶片表面留下圖案。
Here are a few solutions: firstly, plasma kinetic dedust, in a high vacuum conditions, oxygen ions and photoresist or chemical reaction.
這邊有幾個處置方案：第一，等離子不興塵法，在一個矮真空境況下，氧離子與平刻膠或化學精神反響。
A small undesired hole in an oxide, opaque region of a mask or reticle, or in a photoresist layer.
氧化物、掩模或標線的不透明區域，或光刻層中不需要的小孔。
Comparing with all the existing sacrificial layer materials, the photoresist being used as sacrificial layers has some advantages.
同現有的犧牲層材料相比，光致抗蝕劑作犧牲層材料具有一些優越性。
Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing.
本發明的涂料組合物可用作光致抗蝕劑的覆蓋涂層，包括可用在浸漬平版印刷工藝中。
Otherwise, using photoresist as sacrificial layers does not restrict the thickness of structures and the choice of materials.
此外，用光致抗蝕劑作犧牲材料不影響結構的厚度和材料的選擇。
A new method with a one wavelength laser for making 3D diffusion objects true color rainbow hologram on the photoresist plate is presented.
提出了一種用單波長激光制作真彩色彩虹全息圖的新方法。
aqueous solution as the developer the photoresist can be of negative tone.
用氫氧化鈉-乙醇水溶液顯影可以得到負性光刻圖形；
The defining steps of photoresist layer includes exposure and development and the lugs may be joined through stoving to melt.
限定光致抗蝕劑層的步驟還包括曝光、顯影。并可利用烘烤步驟使各凸塊溶融化，以接合各凸塊。
The invention provides a photosensitive compound having low edge roughness (LER) photoresist pattern.
本發明提供了能形成具有低LER（線邊緣粗糙度）的光刻膠圖案的感光化合物。
In microelectronics, the process of removing material, on a chip , left exposed by the exposure and development of the photoresist.
在微電子技術中，通過曝光并顯影光刻膠除去芯片上的物質露出剩馀部分的工藝。
The said method can obtain certain painting homogeneity and relatively high photoresist utilization.
本發明的方法可在保證一定涂覆均勻度的同時，獲得較高的光阻使用率。
Positive Photoresist is rubber particles upward, the same height and diameter of the rubber.
正膠就是膠皮顆粒向上、高度與直徑相等的膠皮。
In addition, the distribution of light fields in the photoresist layer is analyzed by finite-difference time-domain method.
另外，本文還利用時域有限差分法分析了光刻膠層內部的光場分布。
As photoresist has the exposal characteristics, two-spectrum method is fit for measuring the thickness of photoresist.
針對光刻膠有曝光的特性，雙光譜法更適合于膠厚檢測。
Using AZ4620 photoresist throw at plane glass, the measuring thickness of photoresist is benchmark through ellipsometer.
采用AZ4620正型光刻膠甩膠于平面玻璃基片，以橢偏儀測量的結果為基準。
A photoresist pattern can be formed on the dielectric.
在該電介質上形成光致抗蝕劑圖案；
This paper introduces a technical method of etching optical dividing disc with 302~# negative type photoresist .
本文介紹了采用302負性光刻膠刻制光學度盤的工藝方法。
Study on Process of Water-soluble Printing Photoresist.
水性印花感光制版材料的研究。
R. 177 so that it can be used for modulation the photoresist.
177進行分散及穩定處理，使其能夠適用于光阻劑的調制。
A novel pressure sensor based on a high-aspect-ratio structure formed by SU-8 photoresist is proposed.
主要提出了一種利用SU-8光刻膠形成高深寬比結構的新型壓力傳感器。
Preparation of Antifoaming Agent Used for Developing Semi-Aqueous Dry Film Photoresist
印制線路板顯影液用消泡劑的研制
Stripping of Photoresist by an Atmospheric Pressure Radio-Frequency Plasma
常壓射頻低溫冷等離子體清洗光刻膠研究
stripping photoresist to obtain the electrode diagram of a diagrammatic all-organic field-effect transistor device;
剝離光刻膠后得到圖形化了的全有機場效應晶體管器件的電極圖；
Acid Proliferation Generator and Its Application in Chemically Amplified Photoresist
酸增殖源及其在化學增幅抗蝕劑體系中的應用
stripping off photoresist with acetone to carry out imaging to a bottom electrode;
用丙酮剝離掉光刻膠對底電極進行圖形化；
Calculating the Contrast and Threshold Sensitivity of a Positive Photoresist
計算正性光致抗蝕劑的對比度和閾限靈敏度
forming a hard mask layer and a patterned photoresist layer on the semiconductor substrate;
圖案化該光致抗蝕劑層以形成一第一開口；
determining effective adhesion of photoresist to hard - surface photomask blanks and semiconductor wafers during etching
測定在蝕刻期間光致抗蝕劑同硬表面光掩膜坯及半導體片的有效粘附性
Study of Diffractive Field Based Angular Spectrum Theory in Thick Film Photoresist
基于角譜理論的厚層光刻膠衍射光場研究
A method for processing a photoresist composition, comprises: (a) applying on a substrate a photoresist composition;
本發明涉及一種用于處理光刻膠組合物的方法，它包括：（a）將光刻膠組合物涂覆在基材上；
Preparation and Characterization of Methacrylate Photoresist
甲基丙烯酸酯光刻膠的制備與表征
Experimental pretreatment of photoresist emulsified wastewater in the electronic industry
電子工業光致抗蝕劑乳化廢水預處理試驗研究
Enhanced Exposure Model and Its Parameter Measurements for Thick Photoresist
厚層抗蝕劑曝光模型及其參數測量
cyclized polyisoprene rubber negative photoresist; ultraviolet negative photoresist
環化聚異戊二烯橡膠負性光刻膠
Etch Residue Removers and Photoresist Strippers for Semiconductor Cleaning Applications
半導體清洗應用中的刻蝕殘渣去除劑和光阻去膠機
Modeling and Simulation of Negative Chemically Amplified Photoresist for Lithography Process
負性化學放大膠的光刻模型及模擬
and to determine adequate measures of photoresist performance for quality control purposes
它也被用來測定光阻材料在質量控制方面的效力。
Key technique of photoresist through-mask Electrochemical micromachining
光刻膠掩膜微細電化學加工參數的試驗研究
